Features of Relaxation Parameters of Different Types of Quartz During Dynamic Nanoindentation

CZU 538.9:538.951

DOI  https://doi.org/10.52577/eom.2026.62.1.43

This study examined various types of SiO₂ crystals: single-crystal (α-SiO₂), polycrystalline (p-SiO₂), and amorphous (glassy) (a-SiO₂) ones so as to find out the influence of a structural form on changes in relaxation parameters during dynamic nanoindentation. For all studied samples, relaxation parameters were found to depend on the sample type and exhibit a consistent increase with increasing of indenter load. A detailed study of the relaxation parameters (h_e, h_e-p, and h_res) allowed us to determine the mechanisms of plastic deformation of different quartz types during nanoindentation. Computer visualization of the surface topography around the indentations confirmed the involvement of the rotational-translational deformation mechanism of different types of SiO₂ crystals in the formation of hardness indentations. It is shown that the rotational mechanism makes a greater contribution to quartz indentation in the low-load range (P = 10–50 mN), while the contribution of the translational mechanism increases with load increasing (P = 100–500 mN) and during the transition in the series α-SiO₂ → p-SiO₂ → a-SiO₂.

Keywords: quartz of different types: single-crystal, polycrystalline, and amorphous (glassy); dynamic nanoindentation; relaxation parameters; deformation mechanisms.