Rezumat
It is established, that annealing at 850 °C the monocrystal silicon doped with germanium, reduce to the formation internal microheterojunctions Si/SiGe/Si, which enhancement of efficiency to 2,5 % of solar cells made on its basis.
It is established, that annealing at 850 °C the monocrystal silicon doped with germanium, reduce to the formation internal microheterojunctions Si/SiGe/Si, which enhancement of efficiency to 2,5 % of solar cells made on its basis.