Study of the Influence of Ion Beam-Stimulated Pulsed Laser Deposition on Properties of Nanocrystalline ZnO thin Films
Vol. 50 No. 5 (2014), Content
Vol. 50 No. 5 (2014)

Study of the Influence of Ion Beam-Stimulated Pulsed Laser Deposition on Properties of Nanocrystalline ZnO thin Films

  • Ageev O.A.
  • Dostanko A.P.
  • Dguplin V.N.
  • Zamburg E.G.
  • Vakulov D.E.
  • Vakulov Z.E.
  • Alexseev A.M.
  • Golosov D.A.
  • Zavadskiy S.M.
Ageev O.A.
Dostanko A.P.
Dguplin V.N.
Zamburg E.G.
Vakulov D.E.
Vakulov Z.E.
Alexseev A.M.
Golosov D.A.
Zavadskiy S.M.

Abstract

UDC 621.793.14

 

Nanocrystalline thin films of ZnO have been fabrica-ted by the ion-stimulated deposition assisted by the pulsed laser. The influence of the ion/atom ratio on the structural, morphological and electrical parameters of these films is considered. It is established that in case of an ion action on thin films their structure and electrical properties are significantly changed. It is demonstrated that modes of the ion beam-assisted stimulation can have an effect on: an average grain size ranging from 75.4±2.0 nm to 79.1±2.0 nm, roughness in the range from 2.147±1.115 nm to 7.301±1.251 nm as well as resistivity and mobility in the range from (22.6±2)×10-4 Ohm∙cm to (33.6±2)×10-4 Ohm∙cm and from 28.21±4.60 cm2/V∙s to 71.92±2.50 cm2/V∙s, respectively.

 

Keywords: nanotechnology, nanocrystalline films, zinc oxide, pulse laser deposition, ion beam-assisted stimulation, ion/atom ratio, atomic force microscopy, electrophysical properties.

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