Abstract
The protective properties of the oxidic layers on titanium bioengineering materials BT1-0 and OT4-1 formed by anodizing and vacuum-plasma deposition were studied. It was established that the anodic oxide films (AOF) by the thickness of 0,05 μm provide the rather large region of electrochemical inertness of the initual materials than the vacuum-plasma films (VPF) by the thickness of 0,5 μm. An activity of the sys- tems with VPF up to the potentials of oxyden isolation is explained by the penetration of drop-shaped phase of titanium in the substration of coatings, by the influence of titanium sublayer in pores of the coating and by the formation of oxides of the lowest order which suffer an additional oxidation at the anode polarization.